Ion Beam Sputtering

Sputtering Systems

Ion Beam Sputtering: Tight Control. Consistent Layering.

Known for precision and cleanliness, Veeco Ion Beam Sputtering (IBS) systems are ideal when engineers need tight control over film thickness, composition, and optical performance. Using a focused ion beam, IBS dislodges atoms from a target, depositing them onto a surface in smooth, ultra-uniform layers.

How Sputtering Works

A beam of ions, usually argon, is generated and narrowed to strike a solid target. As atoms sputter off the target, they travel toward the substrate where they build up a thin film. At the same time, engineers can adjust beam energy, target angle, and substrate position to fine-tune how the film forms, layer by layer.

Common Sputtering Scenarios

IBS is the go-to method when:

• Ultra-high film uniformity is critical for device performance
• Film smoothness and optical clarity must be top tier
• Materials or device designs require precise tuning of thickness and microstructure

Veeco: High Quality Results That Scale

Our SPECTOR® Ion Beam Sputtering systems offer precise deposition control with real-time process monitoring and flexible configuration options. Whether optimizing coatings for optics or fabricating thin-film electronics, our scalable platforms help engineers produce consistent, high-quality results, from the first layer to full production. When materials matter most, your ultra-precise, high-purity, thin film layer devices will achieve maximum uniformity and repeatability with our ion beam deposition systems.