When materials matter most, your ultra-precise, high-purity, thin film layer devices will achieve maximum uniformity and repeatability with our ion beam deposition systems.
Etch precise, complex features for high-yield production of discrete microelectronic devices and components with the NEXUS® Ion Beam Etch (IBE) Systems.
Your microelectronics, medical devices and automotive components need the thermal resistance and resistivity that can only be achieved with diamond-like carbon films created with our deposition systems.
