Ion Beam Deposition

Deposition Systems

Ion Beam Deposition: For Film Stability That Lasts

When a thin film requires the most stringent structural or compositional properties consistently across every layer, Veeco’s Ion Beam Deposition (IBD) technology is often the answer. Using a focused beam of ions to sputter material from a target, this physical vapor deposition technique builds dense, uniform films with standout adhesion and stability.

An Easily Adjustable Process

A high-energy ion beam, usually made of argon, is aimed at a target material. As the ions strike, atoms are ejected and settle onto the surface below, forming a tightly packed, high-quality film. Meanwhile, engineers can adjust parameters like beam angle, energy, and substrate temperature to control the film’s composition and structure in fine detail.  

Where Ion Beam Deposition Makes an Impact

IBD steps in when:

• Smooth, high-density coatings are a must
• Devices need strong film adhesion to perform reliably over time
• Optical or electronic materials call for precise control over film structure or composition

Veeco: Start-to-Finish Consistency

Our Nexus IBD-LDD Ion Beam Deposition System and third-generation NEXUS® Ion Beam Deposition (IBD) System are built to give engineers complete command of the deposition process. From fine-tuning beam energy to adjusting geometry on the fly, our tools make it easy to achieve consistent results. With real-time diagnostics and a modular design that scales from early-stage R&D to full-scale production, Veeco helps deliver quality, layer after layer. Create ultra-precise, high-purity, thin film layer devices with maximum uniformity and repeatability with our Ion Beam Deposition (IBD) Systems.