Gas & Vapor Delivery Systems

Gas & Vapor Delivery Systems

Gas and Vapor Delivery Systems: Ensuring a Stable Chemical Environment

In thin film deposition, high-quality results start with how process gases are delivered, as they help create the stable environment needed for consistency by controlling flow, pressure and composition to support processes like ALD, CVD, and PVD. Advanced semiconductor devices developed for the most advanced computing processes, such as AI and edge computing, need the ultra-high-purity environments of our gas and vapor deposition delivery systems.

Why Stability Matters

Stable gas delivery supports consistent film quality, reduces defects and improves overall reproducibility. It's critical when developing new processes, scaling production or fine-tuning material properties, whether electrical, optical or mechanical. With the right system in place, engineers can create the exact chemical environment needed for next-generation materials.

Veeco: Better Control, Better Quality

Advanced semiconductor devices developed for the most advanced computing processes, such as AI and edge computing, need the ultra-high-purity environments of our gas and vapor deposition delivery systems. Our gas and vapor delivery systems bring together the precise flow control, smart automation, and built-in diagnostics needed to help engineers maintain stability and repeatability. Flexible, modular design makes it easy to adapt to different gas types and process needs — whether experimenting in the lab or scaling up for full production.