Bibliography

Veeco CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

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Self-Aligned Gate-First In0.7Ga0.3As n-MOSFETs with an InP Capping Layer for Performance Enhancement

Author(s): Gong, Xiao, Ivana, Chin, Hock-Chun, Zhu, Zhu, Lin, You-Ru, Ko, Chih-Hsin, Wann, Clement H and Yeo, Yee-Chia

Published: 2011

Web link: http://esl.ecsdl.org/content/14/3/H117.full

Deposition Temperature and Thermal Annealing Effects on the Electrical Characteristics of Atomic Layer Deposited Al2O3 Films on Silicon

Author(s): Raf�, J M, Zabala, M, Beldarrain, O and Campabadal, F

Published: 2011

Web link: http://jes.ecsdl.org/cgi/doi/10.1149/1.3559458

Properties and characterization of ALD grown dielectric oxides for MIS structures

Author(s): Gieraltowska, S, Sztenkiel, D, Guziewicz, E, Godlewski, M, Luka, G, Witkowski, B S, Wachnicki, L, Lusakowska, E, Dietl, T and Sawicki, M

Published: 2011

Web link: http://arxiv.org/abs/1107.5401

Electron Irradiation Effects on Atomic Layer Deposited High-k Gate Dielectrics

Author(s): Garc�a, H�ctor, Cast�n, Helena, Due�as, Salvador, Bail�n, Luis, Campabadal, Francesca, Rafi, Joan Marc, Zabala, Miguel, Beldarrain, Oihane, Ohyama, Hidenori, Takakura, Kenichirou and Tsunoda, Isao

Published: 2011

Web link: http://ecst.ecsdl.org/cgi/doi/10.1149/1.3633051

Cathodoluminescence of Irradiated Hafnium Dioxide

Author(s): Purcell, Emily A

Published: 2011

Web link: http://oai.dtic.mil/oai/oai?verb=getRecord&metadataPrefix=html&identifier=ADA538491

Epitaxial ZnO Films Grown at Low Temperature for Novel Electronic Application

Author(s): Prze?dzieckaa, E, Guziewiczb, M and Wierzbickaa, A

Published: 2011

Web link:

Epitaxial graphene surface preparation for atomic layer deposition of Al< inf> 2 O< inf> 3

Author(s): Garces, N Y, Wheeler, V D and Hite, J K

Published: 2011

Web link: http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=5928305

Structural and optical properties of ZnO thin films deposited using atomic layer deposition technique

Author(s): PPKBSM, PPB

Published: 2011

Web link: http://eprints.usm.my/25179/1/STRUCTURAL_AND_OPTICAL_PROPERTIES_OF_ZnO_THIN_FILMS_DEPOSITED_USING_ATOMIC_LAYER_DEPOSITION_TECHNIQUE.pdf

Impact of ageing on AlOx layer passivation properties for advanced cell architectures

Author(s): Penaud, J, Rothschild, A. and Jaffrennou, P

Published: 2011

Web link: http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=6186243

Characterisation of HfO2/Si/SiC MOS Capacitors

Author(s): Gammon, Peter M, P�rez-Tom�s, Amador, Jennings, Michael R, Guy, Owen J, Rimmer, N, Llobet, J, Mestres, Narcis, Godignon, Phillippe, Placidi, Marcel, Zabala, M, Covington, James A and Mawby, Philip A

Published: 2011

Web link: http://www.scientific.net/MSF.679-680.674