The Properties of Silica and Hybrid Nanostructures
Author(s): Shalav, A, Kim, T and Elliman, R G
Published: 2010
Web link: http://journals.cambridge.org/production/action/cjoGetFulltext?fulltextid=7959523
Author(s): DeVries, Michael J, Pellin, Michael J and Hupp, Joseph T
Published: 2010
Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
Author(s): Deguns, Eric: Sowa, Mark J: Dalberth, Mark J: Bhatia, Ritwik: Kanjolia, Ravi: Moser, Dan: Sundaram, Ganesh M: Becker, Jill S
Published: 2010
Author(s): Schulze, S., Huang, G, Krause, M and Aubyn, D
Published: 2010
Web link: http://onlinelibrary.wiley.com/doi/10.1002/adem.201080023/full
Atomic Layer Deposition for Nano-manufacturing
Author(s): Deguns, E W
Published: 2010
Web link: http://eprints.internano.org/522/
Author(s): Schamm-Chardon, S, Coulon, P E, Lamagna, L, Wiemer, C., Baldovino, S and Fanciulli, M.
Published: 2010
Author(s): Clavel, Guylhaine, Marichy, Catherine, Willinger, Marc-Georg, Ravaine, Serge, Zitoun, David and Pinna, Nicola
Published: 2010
Direct Atomic Layer Deposition of Ternary Ferrites with Various Magnetic Properties
Author(s): Chong, Yuen Tung, Yau, Eric Man Yan, Nielsch, Kornelius and Bachmann, Julien
Published: 2010
Author(s): Sarkar, Smita, Culp, Jason H, Whyland, Jon T, Garvan, Margret and Misra, Veena
Published: 2010
Web link: http://linkinghub.elsevier.com/retrieve/pii/S1566119910002922
Author(s): Robinson, Joshua A, LaBella III, Michael, Trumbull, Kathleen A, Weng, Xiaojun, Cavelero, Randall, Daniels, Tad, Hughes, Zachary, Hollander, Mathew, Fanton, Mark and Snyder, David
Published: 2010