Coverage Analysis for the Core/Shell Electrode of Dye-Sensitized Solar Cells
Author(s): Tien, Ta-Chang, Pan, Fu-Ming, Wang, Lih-Ping, Tsai, Feng-Yu and Lin, Ching
Published: 2010
Author(s): Hu, Bing, Yao, Jingyuan and Hinds, Bruce J
Published: 2010
Web link: http://scitation.aip.org/content/aip/journal/apl/97/20/10.1063/1.3514253
Raman Spectroscopy of ZnO Thin Films by Atomic Layer Deposition
Author(s): Tapily, K, Gu, D, Baumgart, H, Rigo, M and Seo, J
Published: 2010
Author(s): Hori, Yujin, Mizue, Chihoko and Hashizume, Tamotsu
Published: 2010
Web link: http://jjap.jsap.jp/link?JJAP/49/080201/
Frank van der Merwe Growth of ALD ZnO studied by X-ray Diffraction
Author(s): Tapily, K, Gu, D and Baumgart, H
Published: 2010
Web link: http://ma.ecsdl.org/content/MA2010-02/20/1443.short
Schottky barrier SOI-MOSFETs with high-k La2O3/ZrO2 gate dielectrics
Author(s): Henkel, C, Abermann, S, Bethge, O, Pozzovivo, G, Klang, P, St�ger-Pollach, M and Bertagnolli, E
Published: 2010
Ge p-MOSFETs With Scaled ALD< formula formulatype=
Author(s): Henkel, C, Abermann, S and Bethge, O
Published: 2010
Web link: http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=5610718
Hall Effect, DLTS and CV Characterization of ALD HfO2 and ZnO Thin Films
Author(s): Tapily, K, Apparaju, S, Rozgonyi, G and Gu, D
Published: 2010
Web link: http://ma.ecsdl.org/content/MA2010-02/22/1552.short
Zinc oxide grown by atomic layer deposition – a material for novel 3D electronics
Author(s): Guziewicz, El?bieta, Godlewski, Marek, Krajewski, Tomasz A, Wachnicki, ?ukasz, ?uka, Grzegorz, Domaga?a, Jaros?aw Z, Paszkowicz, Wojciech, Kowalski, Bogdan J, Witkowski, Bart?omiej S, Du?y?ska, Anna and Suchocki, Andrzej
Published: 2010
Author(s): Suresh, A
Published: 2010
Web link: http://repository.lib.ncsu.edu/ir/handle/1840.16/6157