Dopant
Dopant Technologies: Implanting Success at the Atomic Level
In semiconductor manufacturing, electrical performance starts with atomic-level control. Dopant technologies make that possible by introducing carefully measured doping constituents that help devices conduct, switch and perform reliably. For precise control of fluxes for Molecular Beam Epitaxy (MBE) dopant constituents, or for gases that do not require thermal cracking, Veeco’s Dopant products are ideal.
Stay in Control with Veeco
Even small changes in doping can lead to big gains in performance. For precise control of fluxes for MBE dopant constituents, or for gases that do not require thermal cracking, Veeco Dopant products are ideal.
Our Dopant products provide the accuracy and consistency needed to make those changes count — offering precise control over dose and energy fluxuations, along with modular designs that simplify integration.
Finally, advanced diffusion furnaces ensure uniform activation across wafers, while our process experts support profile adjustments as device requirements evolve.
Consistent performance for MBE dopant constituents
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Increase capacity by more than 3x and add the ability to independently actuate the shutters on each crucible with…
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Economical Introduction of Source Gases Without Pre-Cracking
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