Atomic Layer Deposition

Atomic Layer Deposition Systems

What Is ALD?

Atomic Layer Deposition (ALD) is a powerful way to build ultra-thin, super-precise coatings, one atomic layer at a time. It’s especially useful and efficient when working with tiny, complex 3D structures, making it a go-to technique in advanced semiconductor manufacturing.

Why ALD Is a Go-To for Advanced Tech

Engineers choose ALD for one reason: control. It delivers ultra-thin, uniform coatings even on complex 3D structures, helping reduce defects and improve device reliability. It’s compatible with a wide range of materials, from dielectrics to metal nitrides, and supports aggressive scaling for smaller, more efficient designs. That’s why you’ll find ALD everywhere from microprocessors and 3D NAND memory to sensors and MEMS, where precision at the nanoscale really matters.

Built to Scale, Ready for What’s Next

Veeco’s ALD systems are made for engineers pushing the boundaries of semiconductor performance. With atomic-level precision, smart process monitoring, and scalable platforms, our tools support everything from R&D to high-volume production. Device node shrinking continues, with 10nm and 7nm node in production, and development taking place down to 3nm. Our atomic layer deposition tools give you ultimate precision and uniformity for coatings at even the finest nodes. Whether you're developing advanced chips, memory, or sensors, Veeco helps you build with confidence, layer by layer. Bibliography