Fiji – Plasma Enhanced ALD for R&D
Advanced Capabilities for Advanced Research
Our Fiji® series is a modular, high-vacuum thermal ALD system that accommodates a wide range of deposition modes using a flexible architecture and multiple configurations of precursors and plasma gases. The Fiji G2 is a next-generation ALD system capable of performing thermal and plasma-enhanced deposition.
We have applied advanced computational fluid dynamics analyses to optimize the Fiji® reactor, heater, and trap geometry. The system’s intuitive interface makes it easy to monitor and change recipes and processes as needed.
Fiji’s advanced features include:
- Proprietary Chamber Turbo Pumping System
- Improved Plasma Design
- Ergonomic Operator Interface
- In-Situ Ellipsometry
- In-Situ Quartz Crystal Microbalance
- Integrated Ozone
- Glove Box Interface
The Fiji® is available with up to six precursor lines that can accommodate solid, liquid or gas precursors, and six plasma gas lines, offering significant experimental flexibility in a compact and affordable footprint.
Download our latest white paper: Researchers at Technion-Israel Institute of Technology Publish Near-Record Low Oxygen Incorporation and Near Bulk Quality Resistivities in ALD Nitride Films Using Veeco’s Fiji® Plasma ALD System
Technical specifications
| Operational Modes | Continuous Mode™ (Traditional Thermal ALD) Exposure Mode™ (High Aspect Ratio ALD) Plasma Mode™ (Plasma-Enhanced ALD) |
| Substrate Size | Up to 200 mm |
| Substrate Temperature | 500°C 200mm substrate heater standard 800°C 100mm substrate heater optional |
| Deposition Uniformity | 1 σ thickness uniformity on 200mm substrates Thermal Al2O3 – < 1.5% Plasma Al2O3 – < 1.5% |
| Precursors | 4 precursor lines standard, 6 optional Gas, liquid, or solid precursors individually heatable to 200°C Industry standard high speed ALD valves (10ms minimum pulse time) Widely available 50cc (25mL fill max) stainless steel precursor cylinders |
| Gases | 100 sccm Ar precursor carrier gas MFC 500 sccm Ar plasma gas MFC 100 sccm N2 plasma gas MFC 100 sccm O2 plasma gas MFC 100 sccm H2 plasma gas MFC |
| Trap | Integrated, heated, thin foil ALD trap |
| Compatibility | Clean Room Class 100 Compatible |
| Compliance | CE, TUV, FCC
SEMI S2/S8 (optional) |
| Dimensions | Fiji system (base): 1600 x 715 x 1920 mm Fiji with load lock: 1845 x 715 x 1920 mm |
| Power | 220-240 VAC, 4200 W per reactor (excludes pump) |
| Control | Microsoft Windows™ 10 (or higher) Laptop PC, LabView based system control |
| Vacuum Pump | >50CFM dry pump required Available or customer supplied |
| System Options | Spectroscopic Ellipsometer Ports Quartz Crystal Microbalance RGA Port Optical Emission Spectrometer Wafer Plus Ozone Generator Low Vapor Pressure Deposition Glove box Interface Automated Load LockSubstrate RF bias Hazardous gas sensors / Safety PLC Loadlock handoff to other vacuum equipment |