Bibliography

Veeco CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

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Atomic Layer-Deposited Titanium-Doped Vanadium Oxide Thin Films and Their Thermistor Applications

Author(s): Wang, Shuyu, Yu, Shifeng, Lu, Ming, Liu, Mingzhao and Zuo, Lei

Published: 2016

Web link: http://link.springer.com/article/10.1007/s11664-016-5150-9

Wear Behavior of Annealed Atomic Layer Deposited Alumina

Author(s): Hsain, Zakaria, Zeng, Guosong, Strandwitz, Nicholas C and Krick, Brandon A

Published: 2016

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0043164816307505

High-Performance and Traditional Multicrystalline Silicon: Comparing Gettering Responses and Lifetime-Limiting Defects

Author(s): Castellanos, Sergio, Ekstr?m, Kai E, Autruffe, Antoine, Jensen, Mallory A, Morishige, Ashley E, Hofstetter, Jasmin, Yen, Patricia, Lai, Barry, Stokkan, Gaute, del Ca�izo, Carlos and Buonassisi, Tonio

Published: 2016

Web link: http://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=7447656

Hydrophilic/hydrophobic surface of Al2O3thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)

Author(s): Wang, Li-Chun: Han, Yin-Yi: Yang, Kai-Chiang: Chen, Miin-Jang: Lin, Hsin-Chih: Lin, Chung-Kwei: Hsu, Yu-Tong

Published: 2016

Web link: http://linkinghub.elsevier.com/retrieve/pii/S025789721630740X

VxIn (2? x)S 3Intermediate Band Absorbers Deposited by Atomic Layer Deposition

Author(s): McCarthy, Robert F, Weimer, Matthew S, Haasch, Richard T, Schaller, Richard D, Hock, Adam S and Martinson, Alex B F

Published: 2016

Web link: http://pubs.acs.org/doi/abs/10.1021/acs.chemmater.5b04402

Engendering Long-Term Air and Light Stability of a TiO2-supported Porphyrinic Dye via Atomic Layer Deposition

Author(s): Hoffeditz, William L, Son, Ho-Jin, Pellin, Michael J, Farha, Omar K and Hupp, Joseph T

Published: 2016

Web link: http://pubs.acs.org/doi/abs/10.1021/acsami.6b10844

Multilayered Approach for TiO2 Hollow-Shell-Protected SnO2 Nanorod Arrays for Superior Lithium Storage

Author(s): Carvajal, Christian G, Rout, Sangeeta, Mundle, Rajeh and Pradhan, Aswini K

Published: 2016

Web link: http://pubs.acs.org/doi/abs/10.1021/acs.langmuir.6b02801

Seeded Solid Phase Epitaxy of Atomic Layer Deposited Aluminum Oxide

Author(s): Maret, Hannah, Weisberg, Derek, Chan, Helen M and Strandwitz, Nicholas C

Published: 2016

Web link: http://pubs.acs.org/doi/abs/10.1021/acs.cgd.5b01744

Top-gate organic field-effect transistors fabricated on paper with high operational stability

Author(s): Wang, Cheng-Yin, Fuentes-Hernandez, Canek, Chou, Wen-Fang and Kippelen, Bernard

Published: 2016

Web link: http://linkinghub.elsevier.com/retrieve/pii/S1566119916305079

Atomic layer epitaxy for quantum well nitride-based devices

Author(s): Hite, Jennifer: Nepal, Neeraj: Anderson, Virginia R: Freitas, Jaime A: Mastro, Michael A: Eddy, Charles R

Published: 2016

Web link: http://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.2209111