Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy
Author(s): Lan, Yucheng, Wang, Hui, Wang, Dezhi, Gang, Chen and Ren, Zhifeng
Published: 2010
Web link: http://www.hindawi.com/journals/jnt/2010/279608/abs/
Author(s): Zhou, Yinhua, Cheun, Hyeunseok, Potscavage Jr, Willliam J, Fuentes-Hernandez, Canek, Kim, Sung-Jin and Kippelen, Bernard
Published: 2010
Web link: http://xlink.rsc.org/?DOI=c0jm00662a
Integrated Sustainability Analysis of Atomic Layer Deposition for Microelectronics Manufacturing
Author(s): Yuan, Chris Y and Dornfeld, David A
Published: 2010
Web link: http://link.aip.org/link/JMSEFK/v132/i3/p030918/s1&Agg=doi
O-based atomic layer deposition of hexagonal LaO films on Si (100) and Ge (100) substrates
Author(s): Lamagna, L, Wiemer, C., Perego, M and Volkos, S N
Published: 2010
Web link: http://link.aip.org/link/japiau/v108/i8/p084108/s1
Effects of surface passivation during atomic layer deposition of Al2O3 on In0.53Ga0.47As substrates
Author(s): Lamagna, L, Fusi, M, Spiga, S., Fanciulli, M., Brammertz, G, Merckling, C, Meuris, M and Molle, A.
Published: 2010
Sustainable scale-up studies of Atomic Layer Deposition for microelectronics manufacturing
Author(s): Yuan, C Y and Sheng, Y
Published: 2010
Web link: http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=5507682
Air-gap capacitance-Voltage analysis of p-InP surfaces
Author(s): Yoshida, T and Hashizume, T
Published: 2010
Web link: http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=5516369
Author(s): Kuo, Fang Ling, Lin, Ming-Te, Mensah, Benedict A, Scharf, Thomas W and Shepherd, Nigel D
Published: 2010
Microstructure Evolution of Atomic Layer Deposited Zinc-Oxide Films
Author(s): Kotha, R, Elam, D, Hoy, J and Collins, G
Published: 2010
Web link: http://ascelibrary.org/doi/pdf/10.1061/41096(366)329
Author(s): Yang, Zheng, Ko, Changhyun, Balakrishnan, Viswanath, Gopalakrishnan, Gokul and Ramanathan, Shriram
Published: 2010
Web link: http://link.aps.org/doi/10.1103/PhysRevB.82.205101