Bibliography

Veeco CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

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Current collapse reduction in InAlN/GaN MOS HEMTs by in situ surface pre-treatment and atomic layer deposition of ZrO2 high-k gate dielectrics

Author(s): Abermann, S, Pozzovivo, G, Kuzmik, J, Ostermaier, C, Henkel, C, Bethge, O, Strasser, G, Pogany, D, Carlin, J F, Grandjean, N and Bertagnolli, E

Published: 2009

Web link: http://link.aip.org/link/ELLEAK/v45/i11/p570/s1&Agg=doi

Bipolar Resistive Electrical Switching of CuTCNQ Memories Incorporating a Dedicated Switching Layer

Author(s): Muller, R, Krebs, C, Goux, L, Wouters, D J, Genoe, J, Heremans, P, Spiga, S. and Fanciulli, M.

Published: 2009

Web link: http://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=4915750

Atomic Layer Deposition of high-k oxides on InAlN/GaN-based materials

Author(s): Abermann, S, Ostermaier, C, Pozzovivo, G and Kuzmik, J

Published: 2009

Web link: http://ecst.ecsdl.org/content/25/4/123.short

Lanthanum-Zirconate and Lanthanum-Aluminate Based High-? Dielectric Stacks on Silicon Substrates

Author(s): Abermann, S, Henkel, C, Bethge, O, Straif, C J, Hutter, H and Bertagnolli, E

Published: 2009

Web link: http://jes.ecsdl.org/cgi/doi/10.1149/1.3095475

Ge-based interface passivation for atomic layer deposited La-doped ZrO2 on III-V compound (GaAs,In0.15Ga0.85As) substrates

Author(s): Molle, Alessandro, Brammertz, Guy, Lamagna, Luca, Fanciulli, Marco, Meuris, Marc and Spiga, Sabina

Published: 2009

Web link: http://scitation.aip.org/content/aip/journal/apl/95/2/10.1063/1.3182734

Modeling and Characterization of ALD Grown ZnO Nanotubes and their Application to Sub-Micron Devices

Author(s): Abdel-Fattah, Tarek M, Gu, Diefeng, Baumgart, Helmut, Bajpai, Ritu and Zaghloul, Mona

Published: 2009

Web link: http://ecst.ecsdl.org/cgi/doi/10.1149/1.3205046

P-157: Highly-Efficient Gas Diffusion Barriers Based on Nanolaminates Prepared by Low-Temperature ALD

Author(s): Meyer, Jens, Schneidenbach, Daniel, G�rrn, Patrick, Bertram, Franz, Winkler, Thomas, Hamwi, Sami, Johannes, Hans-Hermann, Riedl, Thomas, Kowalsky, Wolfgang, Hinze, Peter and Weimann, Thomas

Published: 2009

Web link: http://doi.wiley.com/10.1889/1.1833654

Al2O3/ZrO2 Nanolaminates as Ultrahigh Gas-Diffusion Barriers-A Strategy for Reliable Encapsulation of Organic Electronics

Author(s): Meyer, Jens, G�rrn, Patrick, Bertram, Franz, Hamwi, Sami, Winkler, Thomas, Johannes, Hans-Hermann, Weimann, Thomas, Hinze, Peter, Riedl, Thomas and Kowalsky, Wolfgang

Published: 2009

Web link: http://doi.wiley.com/10.1002/adma.200803440

Reliable thin film encapsulation for organic light emitting diodes grown by low-temperature atomic layer deposition

Author(s): Meyer, J, Schneidenbach, D, Winkler, T, Hamwi, S, Weimann, T, Hinze, P, Ammermann, S, Johannes, H-H, Riedl, T and Kowalsky, W

Published: 2009

Web link: http://scitation.aip.org/content/aip/journal/apl/94/23/10.1063/1.3153123

TiO2/TiSi2 heterostructures for high-efficiency photoelectrochemical H2O splitting

Author(s): Lin, Y, Zhou, S, Liu, X, Sheehan, S and Wang, D

Published: 2009

Web link: http://pubs.acs.org/stoken/beta/twitter/abs/10.1021/ja808426h