Bibliography

Veeco CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

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The seventh mass extinction: Human-caused events contribute to a fatal consequence

Author(s): Carpenter, P A and Bishop, P C

Published: 2009

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0016328709001074

WHAT MAKES US HUMAN?

Author(s): Spy, E

Published: 2009

Web link: http://delta.nitt.edu/books/Scientific%20American/Scientific%20American%20-%202009.05%20-%20What%20Makes%20Us%20Human.pdf

Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor

Author(s): B�low, Tim, Gargouri, Hassan, Siebert, Mirko, Rudolph, Rolf, Johannes, Hans-Hermann and Kowalsky, Wolfgang

Published: 2009

Web link: http://www.nanoscalereslett.com/content/9/1/223

Transition Metal Binary Oxides for ReRAM Applications

Author(s): Spiga, S., Lamperti, A, Cianci, E and Volpe, F G

Published: 2009

Web link: http://ecst.ecsdl.org/content/25/6/411.short

The wisdom of nature: An evolutionary heuristic for human enhancement

Author(s): Bostrom, N and Sandberg, A

Published: 2009

Web link: http://citeseerx.ist.psu.edu/viewdoc/download?doi=10.1.1.143.9344&rep=rep1&type=pdf

The fabrication of nanoelectrodes based on a single carbon nanotube

Author(s): Shen, Jun, Wang, Wei, Chen, Qing, Wang, Mingsheng, Xu, Shengyong, Zhou, Yinglin and Zhang, Xin-Xiang

Published: 2009

Web link: http://stacks.iop.org/0957-4484/20/i=24/a=245307?key=crossref.20258190605a3ebc9f645c4fab27b6a8

Impact of Germanium Surface Conditioning and ALD-growth Temperature on Al2O3/ZrO2 High-k Dielectric Stacks

Author(s): Bethge, Ole, Abermann, Stephan, Henkel, Christoph, Straif, Christoph J, Hutter, Herbert and Bertagnolli, Emmerich

Published: 2009

Web link: http://jes.ecsdl.org/cgi/doi/10.1149/1.3205455

Low temperature atomic layer deposition of high-k dielectric stacks for scaled metal-oxide-semiconductor devices

Author(s): Bethge, Ole, Abermann, Stephan, Henkel, Christoph and Bertagnolli, Emmerich

Published: 2009

Web link: http://dx.doi.org/10.1016/j.tsf.2009.03.190

Atomic layer deposited ultra thin HfO2 and Al2O3 interfacial layers for high performance Dye Sensitized Solar Cells

Author(s): Shanmugam, Mariyappan, Baroughi, M. F., Galipeau, D and Ropp, M

Published: 2009

Web link: http://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=5411279

Titania coated silica nanowires

Author(s): Shalav, A and Venkatachalam, D K

Published: 2009

Web link: http://journals.cambridge.org/production/action/cjoGetFulltext?fulltextid=7970692