Bibliography

Veeco CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

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Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors

Author(s): Provine, J.: Schindler, Peter: Torgersen, Jan: Kim, Hyo Jin: Karnthaler, Hans-Peter: Prinz, Fritz B

Published: 2016

Web link: http://scitation.aip.org/content/avs/journal/jvsta/34/1/10.1116/1.4937991

High-gain infrared-to-visible upconversion light-emitting phototransistors

Author(s): Yu, Hyeonggeun: Kim, Doyoung: Lee, Jinhyung: Baek, Sujin: Lee, Jaewoong: Singh, Rajiv: So, Franky

Published: 2016

Web link: http://www.nature.com/doifinder/10.1038/nphoton.2015.270

Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells

Author(s): Kang, Moon Hee: Ok, Young-Woo: Rohatgi, Ajeet

Published: 2016

Web link: http://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=7469310

Tailoring the Dielectric Layer Structure for Enhanced Carrier Mobility in Organic Transistors: The Use of Hybrid Inorganic/Organic Multilayer Dielectrics

Author(s): de Pauli, Muriel, Zschieschang, Ute, Barcelos, Ingrid D, Klauk, Hagen and Malachias, Angelo

Published: 2016

Web link: http://onlinelibrary.wiley.com/doi/10.1002/aelm.201500402/full

Characterization of Thin Film Dissolution in Water with in Situ Monitoring of Film Thickness Using Reflectometry

Author(s): Yersak, Alexander S, Lewis, Ryan J, Tran, Jenny and Lee, Yung C

Published: 2016

Web link: http://pubs.acs.org/doi/abs/10.1021/acsami.6b03606

Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride

Author(s): Provine, J, Schindler, Peter, Kim, Yongmin, Walch, Steve P, Kim, Hyo Jin, Kim, Ki-Hyun and Prinz, Fritz B

Published: 2016

Web link:

Tuning the mechanical properties of vertical graphene sheets through atomic layer deposition

Author(s): Davami, Keivan, Jiang, Yijie, Cortes, John, Chen, Lin, Shaygan, Mehrdad, Turner, Kevin T and Bargatin, Igor

Published: 2016

Web link: http://iopscience.iop.org/article/10.1088/0957-4484/27/15/155701

Few-layer HfS2 transistors

Author(s): Kanazawa, Toru, Amemiya, Tomohiro, Ishikawa, Atsushi, Upadhyaya, Vikrant, Tsuruta, Kenji, Tanaka, Takuo and Miyamoto, Yasuyuki

Published: 2016

Web link: http://www.nature.com/articles/srep22277

Vapour sensitivity of an ALD hierarchical photonic structure inspired by Morpho

Author(s): Poncelet, Olivier: Tallier, Guillaume: Mouchet, S�bastien R: Crahay, Andr�: Rasson, Jonathan: Kotipalli, Ratan: Deparis, Olivier: Francis, Laurent A

Published: 2016

Web link: http://stacks.iop.org/1748-3190/11/i=3/a=036011?key=crossref.416076e32876d036271b2c9614b350ed

Progression towards high efficiency perovskite solar cells via optimisation of the front electrode and blocking layer

Author(s): Yates, Heather M: Afzaal, Mohammad: Walter, Arnaud: Hodgkinson, John L: Moon, Soo-Jin: Sacchetto, Davide: Br�uninger, Matthias: Niesen, Bj�rn: Nicolay, Sylvain: McCarthy, Melissa: Pemble, Martyn E: Povey, Ian M: Ballif, Christophe

Published: 2016

Web link: http://pubs.rsc.org/en/content/articlehtml/2016/tc/c6tc04647a