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Enhanced electron field emission properties of high aspect ratio silicon nanowire?zinc oxide core?shell arrays – Physical Chemistry Chemical Physics (RSC Publishing) DOI:10.1039/C2CP40238F

Author(s): Kale, V. S.: Prabhakar, R. R.: Pramana, S. S.: Rao, M.

Published: 2012

Web link: http://pubs.rsc.org/en/content/articlehtml/2012/cp/c2cp40238f

RBS/Channeling Analysis of Zinc Oxide Films Grown at Low Temperature by Atomic Layer Deposition

Author(s): Ratajczak, R, Stonert, A, Guziewicz, E and Giera?towska, S

Published: 2012

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A plasmonic enhanced photodetector based on silicon nanocrystals obtained through laser ablation

Author(s): Alkis, Sabri, Oruc, Feyza B, Orta�, B�lend, Ko?ger, A Cahit and Okyay, Ali K

Published: 2012

Web link: http://iopscience.iop.org/article/10.1088/2040-8978/14/12/125001

Explanation of threshold voltage scaling in enhancement-mode InAlN/AlN?GaN metal oxide semiconductor high electron mobility transistors on Si substrates

Author(s): Alexewicz, A, Ostermaier, C, Henkel, C, Bethge, O, Carlin, J F, Lugani, L, Grandjean, N, Bertagnolli, E, Pogany, D and Strasser, G

Published: 2012

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0040609012006748

Probing the Structure and Chemistry of Perylenetetracarboxylic Dianhydride on Graphene Before and After Atomic Layer Deposition of Alumina

Author(s): Johns, James E, Karmel, Hunter J, Alaboson, Justice M P and Hersam, Mark C

Published: 2012

Web link: http://pubs.acs.org/doi/abs/10.1021/jz300802k

High-Performance Printed Carbon Nanotube Thin-Film Transistors Array Fabricated by a Nonlithography Technique Using Hafnium Oxide Passivation Layer and Mask

Author(s): Raman Pillai, Suresh Kumar and Chan-Park, Mary B

Published: 2012

Web link: http://pubs.acs.org/doi/abs/10.1021/am302431e

Reduced Heterogeneity of Electron Transfer into Polycrystalline TiO2 Films: Site Specific Kinetics Revealed by Single-Particle Spectroscopy

Author(s): Jin, S. Y., Martinson, A. B. F. and Wiederrecht, G. P.

Published: 2012

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2 MeV electron irradiation effects on the electrical characteristics of metal?oxide?silicon capacitors with atomic layer deposited Al2O3, HfO2 and nanolaminated dielectrics

Author(s): Raf�, J M, Campabadal, F, Ohyama, H and Takakura, K

Published: 2012

Web link: http://www.sciencedirect.com/science/article/pii/S0038110112002250

Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition

Author(s): Alevli, Mustafa: Ozgit, Cagla: Donmez, Inci: Biyikli, Necmi

Published: 2012

Web link: http://scitation.aip.org/content/avs/journal/jvsta/30/2/10.1116/1.3687937

Stable, microfabricated thin layer chromatography plates without volume distortion on patterned, carbon and Al2O3-primed carbon nanotube forests

Author(s): Jensen, D S: Kanyal, S S: Gupta, V: Vail, M A

Published: 2012

Web link: http://www.sciencedirect.com/science/article/pii/S0021967312011594