Bibliography

Veeco CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

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Spatially separated atomic layer deposition of Al2O3, a new option for high-throughput Si solar cell passivation

Author(s): Vermang, B., Rothschild, A., Racz, A., John, J., Poortmans, J., Mertens, R., Poodt, P., Tiba, V. and Roozeboom, F

Published: 2011

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Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures

Author(s): Alevli, Mustafa: Ozgit, Cagla: Donmez, Inci: Biyikli, Necmi

Published: 2011

Web link: http://doi.wiley.com/10.1002/pssa.201127430

Metal Infiltration into Biomaterials by ALD and CVD: A Comparative Study

Author(s): Lee, Seung-Mo, Pippel, Eckhard and Knez, Mato

Published: 2011

Web link: http://onlinelibrary.wiley.com/doi/10.1002/cphc.201000923/full

Spatially separated atomic layer deposition of Al2O3, a new option for high?throughput Si solar cell passivation

Author(s): Vermang, B., Rothschild, A. and Racz, A.

Published: 2011

Web link: http://onlinelibrary.wiley.com/doi/10.1002/pip.1092/full

Lab to Fab: Path to Commercialization

Author(s): Becker, J

Published: 2011

Web link: http://eprints.internano.org/1732/1/Becker-0927A.pdf

On the blistering of atomic layer deposited Al< inf> 2 O< inf> 3 as Si surface passivation

Author(s): Vermang, B., Goverde, H and Lorenz, A

Published: 2011

Web link: http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=6185916

The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition

Author(s): Alevli, M.: Ozgit, C.: Donmez, I.

Published: 2011

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Cubic/Tetragonal Phase Stabilization in High-? ZrO2 Thin Films Grown Using O3-Based Atomic Layer Deposition

Author(s): Lamperti, A, Lamagna, L, Congedo, G. and Spiga, S.

Published: 2011

Web link: http://jes.ecsdl.org/content/158/10/G221.full

Effects of surface passivation during atomic layer deposition of Al< sub> 2 O< sub> 3 on In< sub> 0.53 Ga< sub> 0.47 As substrates

Author(s): Lamagna, L, Fusi, M, Spiga, S. and Fanciulli, M.

Published: 2011

Web link: http://www.sciencedirect.com/science/article/pii/S0167931710004077

Interface composition of atomic layer deposited HfO2 and Al2O3 thin films on InAs studied by X-ray photoemission spectroscopy

Author(s): Timm, R, Hjort, M, Fian, A, Thelander, C, Lind, E, Andersen, J N, Wernersson, L E and Mikkelsen, A

Published: 2011

Web link: http://linkinghub.elsevier.com/retrieve/pii/S0167931711003467