Product News | Apr 11, 2018
Flexible GENxcel™ MBE Deposition System Earns Veeco its Fourth Innovation Award in Seven Years
PLAINVIEW, N.Y., April 11, 2018 —Veeco Instruments Inc. (NASDAQ: VECO) today announced its GENxcel R&D Molecular Beam Epitaxy (MBE) System earned the 2018 Compound Semiconductor (CS) Industry Innovation Award. Hosted by Compound Semiconductor magazine, the CS Industry Awards celebrate the success of companies across five unique categories. Specifically, the Innovation Award honors the most significant breakthrough in compound semiconductor manufacturing over the last 12 months.
“We are honored to have the GENxcel MBE System recognized by Compound Semiconductor and our industry peers. The recognition is especially meaningful because winners are voted on by our respected colleagues, customers and collaborators,” said Gerry Blumenstock, vice president and general manager of MBE and ALD products at Veeco. “We continue to be committed to creating the most advanced and highest quality tools to support leading-edge compound semiconductor R&D and production.”
The GENxcel R&D MBE system builds on the success of the GENxplor® MBE system designed for compound semiconductor R&D and pilot production markets. The system produces high-quality epitaxial layers on substrates up to 100mm in diameter. The innovative architectural concept of GENxcel reduces the system footprint by 40 percent compared to similar 100mm wafer systems, improves the ease of maintenance, and allows users to easily integrate additional deposition and analysis chambers—specifically Veeco’s new atomic layer deposition (ALD) product line.
The CS Industry Awards is a peer-voted awards program honoring people, processes and products within the compound semiconductor industry. Winners were honored at a ceremony on April 10 in conjunction with the CS International Conference in Brussels, Belgium. For a complete list of 2018 winners, visit www.csawards.net/winners.
Previous Veeco products that have won the CS Industry Innovation Award include the TurboDisc® EPIK700™ Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) System in 2015, the GENxplor MBE system in 2014, and the TurboDisc® MaxBright® Multi-Reactor MOCVD System in 2012. To learn more about Veeco’s GENxcel R&D MBE system, please visit http://www.veeco.com/products/genxcel-randd-mbe-system.
Veeco (NASDAQ: VECO) is a leading manufacturer of innovative semiconductor process equipment. Our proven MOCVD, lithography, laser annealing, ion beam and single wafer etch & clean technologies play an integral role in producing LEDs for solid-state lighting and displays, and in the fabrication of advanced semiconductor devices. With equipment designed to maximize performance, yield and cost of ownership, Veeco holds technology leadership positions in all these served markets. To learn more about Veeco’s innovative equipment and services, visit www.veeco.com.
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