Veeco Launches EPIK 700 MOCVD System to Accelerate Adoption of Solid-State Lighting

Veeco Instruments Inc. (Nasdaq:VECO) introduced today the new TurboDisc® EPIK 700™ Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) system that combines the industry’s highest productivity and best-in-class yields with low cost of operation, further enabling lower manufacturing costs for light emitting diodes (LEDs) for general lighting applications.

Veeco Launches EPIK 700 MOCVD System to Accelerate Adoption of Solid-State Lighting

Sep 04, 2014
PLAINVIEW, N.Y.–(BUSINESS WIRE)– Veeco Instruments Inc. (Nasdaq:VECO) introduced today the new TurboDisc® EPIK 700™ Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) system that combines the industry’s highest productivity and best-in-class yields with low cost of operation, further enabling lower manufacturing costs for light emitting diodes (LEDs) for general lighting applications.

Veeco introduces TurboDisc EPIK700 GaN MOCVD System for high volume LED manufacturing to accelerate ... Veeco introduces TurboDisc EPIK 700 GaN MOCVD System for high volume LED manufacturing to accelerate general lighting adoption. (Photo: Business Wire)

Based on Veeco’s proven TurboDisc technology, the EPIK 700 MOCVD system enables customers to achieve a cost per wafer savings of up to 20 percent compared to previous generations through improved wafer uniformity, reduced operating expenses, and increased productivity. The EPIK 700 system features a reactor with more than twice the capacity of current generation reactors. This increased volume, combined with productivity advancements within the reactor, results in a 2.5x throughput advantage over previous generation MOCVD systems.

“The EPIK 700 is our latest in a distinguished line of technologically advanced MOCVD reactors,” said William J. Miller , Ph.D., Executive Vice President, Veeco. “We are pleased to say that one of the world’s top LED manufacturers has thoroughly evaluated and accepted the EPIK 700 due to its production worthiness, stable process and reproducible results. We anticipate that this new product will help our customers further succeed in the solid-state lighting market, by driving down LED manufacturing costs and increasing productivity.”

Since the introduction of the TurboDisc K465i GaN MOCVD System in 2010, Veeco has steadily improved its customers’ cost of ownership and became the world’s leading MOCVD equipment supplier. In 2011, Veeco launched the industry’s first multi-reactor MOCVD system, the award-winning TurboDisc MaxBright® MOCVD System. In addition, Veeco’s MOCVD TurboDisc technology has been recognized as best in the industry by LED trade associations in each year from 2011 to 2013.

“The EPIK 700 is another game-changer for the LED industry,” said Jim Jenson , Senior Vice President and General Manager, Veeco MOCVD. “In addition to higher capacity and throughput, the system contains proprietary technologies within the reactor that improve wavelength uniformity and drive higher yields in a tighter bin. By combining the advanced TurboDisc reactor design with excellent uniformity, higher productivity, proven automation, low consumable costs and improved footprint efficiency, we have significantly improved the cost per wafer for our customers.”

According to a recent IHS Research report, LED unit penetration is expected to reach 15 percent in such key markets as China, Japan, North America and Europe by 2016 and more than double to 40 percent by 2020.

About TurboDisc EPIK 700 GaN MOCVD SYSTEM

Veeco’s new breakthrough EPIK 700 MOCVD system is the LED industry’s highest productivity MOCVD system that reduces cost per wafer by up to 20 percent compared to previous generations. Available in one-and two-reactor configurations, EPIK 700 features breakthrough technologies including the new IsoFlange™ center injection flow and TruHeat™ wafer coil that provide homogeneous laminar flow and uniform temperature profile across the entire wafer carrier. These technological innovations produce wavelength uniformity to drive higher yields in a tighter bin. EPIK 700 offers a 2.5x throughput advantage over other systems due to its large reactor size. Designed for mass production, EPIK 700 accommodates 31×4”, 12×6” and 6×8” wafer carrier sizes. Customers can easily transfer processes from existing TurboDisc systems to the new EPIK 700 MOCVD platform for quick-start production of high quality LEDs. Because of the flexible EPIK 700 MOCVD platform, more upgrades, added benefits and future enhancements will continue to differentiate this world-class system.

About Veeco

Veeco’s process equipment solutions enable the manufacture of LEDs, flexible OLED displays, solar cells, power electronics, hard drives, MEMS and wireless chips. We are the market leader in LED, MBE, Ion Beam and other advanced thin film process technologies. Our high performance systems drive innovation in energy efficiency, consumer electronics and network storage and allow our customers to maximize productivity and achieve lower cost of ownership. For information on our company, products and worldwide service and support, please visit www.veeco.com.

To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management’s Discussion and Analysis sections of Veeco’s Annual Report on Form 10-K for the year ended December 31, 2013 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases.Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.

Source: Veeco Instruments Inc.

Veeco Instruments Inc.Investors:Debra Wasser, 516-677-0200 x1472

dwasser@veeco.com

or

Media:

Jeffrey Pina, 516-677-0200 x1222

jpina@veeco.com

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