Dopant Technologies: Implanting Success at the Atomic Level

In semiconductor manufacturing, electrical performance starts with atomic-level control. Dopant technologies make that possible by introducing carefully measured doping constituents that help devices conduct, switch and perform reliably. For precise control of fluxes for Molecular Beam Epitaxy (MBE) dopant constituents, or for gases that do not require thermal cracking, Veeco’s Dopant products are ideal.

Stay in Control with Veeco

Even small changes in doping can lead to big gains in performance. For precise control of fluxes for MBE dopant constituents, or for gases that do not require thermal cracking, Veeco Dopant products are ideal. Our Dopant products provide the accuracy and consistency needed to make those changes count — offering precise control over dose and energy fluxuations, along with modular designs that simplify integration. Finally, advanced diffusion furnaces ensure uniform activation across wafers, while our process experts support profile adjustments as device requirements evolve.

High-Temperature Processing Systems: Unlocking Performance Under Extreme Conditions

When low vapor pressure materials demand more heat to transform, Veeco’s high-temperature MBE sources step in. Built for thermal extremes, they power the kinds of reactions and structural changes that unlock next-level device performance.

Veeco: Unmatched Stability & Control

Our high-temperature MBE sources are engineered for stability from start to cooldown. Precision ramping, uniform heating, and flexible control interfaces help engineers dial in everything from dwell time to cooling rates. And built-in shielding protects both tools and operators, making it easier to manage heat without losing control. Veeco High Temperature Source is available for low-vapor pressure materials at temperatures up to 2000°C.

Low-Temperature Processing: Control the Heat, Unlock Performance

Low-temperature processing systems make it possible to handle advanced, delicate materials without subjecting them to high heat. By maintaining gentle thermal conditions, they unlock new possibilities for working with polymers, flexible films and other materials that can’t tolerate the extreme temperatures of conventional processing.

How Low-Temperature Processing Works

These systems use tightly controlled energy input and active cooling to keep substrate temperatures typically below 200°C. That means engineers can still deposit, cure or modify materials without compromising their properties. It’s all about giving materials what they need and nothing they can’t handle.

Veeco: Thermal Control You Can Trust

Whether scaling up from lab experiments or running full production, our low-temp systems – which combine precision thermal management, integrated cooling and modular design – let engineers process heat-sensitive materials with confidence and without compromise. Achieve accurate and consistent low temperature epitaxial source performance for a variety of applications through Veeco low temperature epitaxial sources.

Medium-Temperature Processing: Striking the Perfect Balance for Optimal Results

Medium-temperature processing systems deliver more thermal energy than low-temp tools can provide, without crossing into the stress-inducing range of high-temp processes. Operating between 200–600°C, they create the perfect balance for enabling critical film transformations, crystallization and adhesion. Medium-temperature MBE sources can be used for virtually any application—from hot-lip SUMO sources to standard filament for thermal effusion.

Process Overview: Stability + Control = Impact

Using stable, tightly controlled heating systems, these platforms deliver consistent energy across the substrate. Engineers can dial in the right conditions for deposition, annealing or material tuning — getting the exact thermal impact they need without overexposing sensitive layers.

Veeco: Thermal Balance, Repeatable Results

Whether refining prototypes or ramping up production, our medium-temperature platforms – with real-time thermal monitoring, energy efficiency and adaptable configurations – help engineers hit the thermal sweet spot, balancing performance and protection.

Customizable Tools for Uncommon Challenges

When conventional sources hit their limits, specialty sources step in. These custom-designed plasma and vapor sources are engineered for III-V MBE and compound semiconductor applications where unique material delivery and control are critical.

What Makes Them Different

Specialty sources go beyond standard configurations. With tailored plasma generation, advanced ion control and the ability to handle everything from volatile precursors to refractory compounds, they open the door to innovative process development and precision film growth.

Where Specialty Sources Show Up

• Supporting integration of niche materials in next-gen device structures
• Delivering custom energy profiles to fine-tune film properties
• Enabling development of new materials and architectures beyond traditional tool limits

Veeco: Pushing the Limit of What's Possible

Veeco offers the most comprehensive selection of MBE sources, including single and dual filament designs. Our specialty source lineup includes customizable plasma systems and integration-ready modules. With real-time diagnostics and tight process control, these tools empower engineers to overcome complex deposition challenges and advance what’s possible in compound semiconductor fabrication.