Gridded DC Ion Sources: Optimizing Beam Stability for Fabrication
Ion-assisted processes like sputtering, etching, and surface treatment depend on a beam that’s stable, uniform, and tightly controlled. Gridded DC ion sources make that happen, giving engineers the precision they need to fine-tune ion energy and current density for reliable results.
How Gridded Ion Sources Work
Ion sources use a series of grids to extract ions from a plasma, creating a focused beam that can be shaped to match process goals. By adjusting grid voltage and spacing, engineers can dial in the right ion energy, controlling how ions interact with the material surface at every step.
Carefully designed grids help keep the beam uniform across the target, which means smoother film growth and more consistent etching across the board.
Where They Excel
Gridded ion sources shine in processes that demand consistent energy delivery and full-beam control:
- Ion-assisted deposition that boosts adhesion and material properties
- High-precision etching for semiconductors and optical coatings
- Surface modification where subtle energy shifts make all the difference
Veeco: Consistency That Scales
Wherever your process goes, Veeco helps keep it on track. We offer proven linear gridded DC Ion Sources for highly uniform, reliable ion beam deposition process platforms utilizing large/wide individual substrates or large substrate batches.
