Veeco's Gridless End Hall Ion Sources provide high beam current for vacuum coating processes.
Dramatically increased beam current and a removable anode assembly adds new value to the Mark II+ End-Hall Ion Source.
Maximize ion source performance and thin film etch, cleaning and deposition uniformity with the Mark II+ Ion Source Controller.
For applications requiring high-current, low-energy ions, the Mark II+ Gridless High Output Ion Source is designed for vacuum coating processes in chambers from 70-130cm in diameter.
Improve process uniformity and prevent substrate damage with Veeco's Mark I+ gridless ion source. It provides a high beam current designed for vacuum coating processes.