ALD Periodic Table
The Elemental Building Blocks of Deposition
The ALD Periodic Table is a visual guide to the elemental building blocks of atomic layer deposition. Organized by both chemistry and purpose, it helps engineers quickly find materials that meet their priorities, whether that’s conductivity, durability, clarity or thermal stability.What it Includes: From Oxides to Dopants
Each category in the table plays a distinct role in thin-film engineering. Oxides like Al₂O₃ and HfO₂ deliver high-k performance and excellent moisture resistance for gate dielectrics and passivation layers. Nitrides such as TiN and GaN are valued for thermal stability and mechanical strength, ideal for diffusion barriers and RF devices. Metals including W, Pt and Ru enable precise, conformal electrode formation. Other groups bring added functionality. Phosphides and arsenides (e.g., InP, GaAs) power high-speed III-V devices and optoelectronics. Chalcogenides support phase-change memory and IR optics. Carbides and fluorides lend extreme hardness or transparency, while dopants like B, P and As fine-tune conductivity across the stack.Use Cases for the ALD Periodic Table:
- Match materials to electrical, optical or structural property targets
- Plan deposition conditions to suit thermal and chemical limits
- Discover emerging elements for next-gen R&D applications
Veeco: Knowledge at the Atomic Level
With the ALD Periodic Table and our proven platform expertise, engineers gain more than just materials insight. They get the context and control to build smarter stacks, optimize performance and unlock new possibilities, layer by layer.