NEXUS PVDi Physical Vapor Deposition System

Flexible Deposition Platform Serves Wide Range of Applications

Veeco’s single-target NEXUS PVDi Physical Vapor Deposition System offers maximum flexibility for a wide range of thin film deposition applications. The NEXUS PVD is 200mm capable and features advanced process capabilities, unsurpassed uniformity and multiple deposition modes.

  • Unsurpassed reliability and uniformity helps boost process yields
  • Higher throughput and uptime for lower cost of ownership
  • NEXUS platform integrates with a broad range of Veeco technologies, such as ion beam deposition, ion beam etch and atomic layer deposition

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