NEXUS PVD-1 Physical Vapor Deposition System

vapor deposition module. Compatible with a wide range of wafer sizes, the system can be tailored to multiple data storage applications, such as oxide and nitride deposition, as well as magnetic materials. It also offers a high-performance, cost-effective tool for semiconductor, GaAs and packaging applications.

Easily configured to meet specific process and production requirements
Supports wafer sizes from 3″ to 8″ round
Standard accessories include cathodes, wafer chucks, gas manifolds, shutters and pumping packages
Modularity simplifies operator and maintenance training requirements, as well as spare part stocking
Designed for fast, simple integration with NEXUS Ion Beam Etch, Ion Beam Deposition and other Physical Vapor Deposition tools

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