Ion Beam Deposition

Photomask manufacturing demands the highest levels of particle control while depositing sophisticated multiple-layer film structures. This challenge is met with Veeco’s Nexus IBD-LDD Ion Beam Deposition System. Veeco has successfully served the photomask market since the 1990s, and the years of learning have resulted in today’s state-of-the-art system. The IBD-LDD system is ideal for multilayer deposition on EUV mask blanks, and other mask applications requiring low defect levels and advanced thin films.

• Production-proven design
• Lowest defect density
• Excellent uniformity and repeatability
• Deposit multiple materials in same chamber
• Can be integrated into other process modules into a cluster tool