Mark II+ Gridless High Output

For Applications Requiring High-Current, Low-Energy Ions

The Mark II+ Gridless High Output Ion Source features a hollow cathode and is designed for vacuum coating processes in chambers from 70-130 cm in diameter.

  • For applications such as surface pre-clean and assisted deposition that require high-current, low-energy ions
  • Provides improved control of film stress and stoichiometry
  • Water-cooled
  • Well-suited to precision or industrial optical coating environments
  • Flexible integration permits space-saving system design and broad beam angle
  • Can be configured with or without filaments, depending upon the process requirements

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