Mark II+ Gridless High Output

For Applications Requiring High-Current, Low-Energy Ions

The Mark II+ Gridless High Output Ion Source features a hollow cathode and is designed for vacuum coating processes in chambers from 70-130 cm in diameter.

• For applications such as surface pre-clean and assisted deposition that require high-current, low-energy ions
• Provides improved control of film stress and stoichiometry
• Water-cooled
• Well-suited to precision or industrial optical coating environments
• Flexible integration permits space-saving system design and broad beam angle
• Can be configured with or without filaments, depending upon the process requirements