Mark II+ Controller

Designed to Match End-Hall Ion Source Plasma Characteristics

Maximize ion source performance and thin film etch, cleaning and deposition uniformity with the Mark II+ Ion Source Controller. Engineered by Veeco to specifically match the plasma characteristics of End-Hall ion sources, it helps ensure highly productive process runs and precise control of ion beam output.

• State-of-the-art switching supplies
• Integrated gas control
• Automated arc recovery
• User-friendly graphical interface and automation features enhance process productivity
• Deliver stable and reliable power for highly uniform and stable ion beam processes