Mark II+ Controller

Designed to Match End-Hall Ion Source Plasma Characteristics

Maximize ion source performance and thin film etch, cleaning and deposition uniformity with the Mark II+ Ion Source Controller. Engineered by Veeco to specifically match the plasma characteristics of End-Hall ion sources, it helps ensure highly productive process runs and precise control of ion beam output.

  • State-of-the-art switching supplies
  • Integrated gas control
  • Automated arc recovery
  • User-friendly graphical interface and automation features enhance process productivity
  • Deliver stable and reliable power for highly uniform and stable ion beam processes

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