Mark I+ Gridless Ion Source

Provides High Beam Current for Vacuum Coating Processes

Ideally suited to surface pre-clean, assisted deposition and select etch applications, the Mark I+ gridless ion source provides a high beam current designed for vacuum coating processes, improving process uniformity and preventing substrate damage.

  • Designed for vacuum coating processes in systems of 750mm diameter or less
  • Effective for use with applications requiring high-current, low-energy ions
  • High beam current especially useful for controlling film stress and stoichiometry
  • Also well-suited to industrial processes, including reactive environments
  • Mark Series Ion Source Controller (available separately) complements source performance and provides stable and reliable process operation

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