Enabling As/P-based Photonics Devices with Over 20 Years of High-Volume MOCVD Experience
The Lumina® system is based on Veeco’s industry leading MOCVD TurboDisc® technology which features excellent uniformity and low defectivity over long campaigns for exceptional yield and flexibility. In addition, Veeco’s proprietary technology drives uniform thermal control for excellent thickness and compositional uniformity. Providing a seamless wafer size transition, the system is capable of depositing high quality As/P epitaxial layers on wafers up to eight inches in diameter. The Lumina system allows users to customize their systems for maximum value.
Mini and MicroLEDs
Webcast on demand: Veeco partnered with Laser Focus World, II-VI and Yole Développement to deliver a comprehensive webcast titled Trends and Challenges in Semiconductor Lasers for Optical Communications. Available for replay here.