Lumina As/P MOCVD Systems for Photonics Applications

Enabling As/P-based Photonics Devices with Over 20 Years of High-Volume MOCVD Experience
The Lumina® system is based on Veeco’s industry leading MOCVD TurboDisc® technology which features excellent uniformity and low defectivity over long campaigns for exceptional yield and flexibility. In addition, Veeco’s proprietary technology drives uniform thermal control for excellent thickness and compositional uniformity. Providing a seamless wafer size transition, the system is capable of depositing high quality As/P epitaxial layers on wafers up to eight inches in diameter. The Lumina system allows users to customize their systems for maximum value.

Designed to advance next generation devices


  • 3D Sensing
  • LiDAR
  • High Speed Data Communication

Edge-Emitting Lasers

  • Advanced Optical Communications
  • Silicon Photonics

Mini and MicroLEDs

  • 4K and 8K Television Displays
  • Smartphones
  • Wearable Devices
  • AR/VR (Augmented Reality / Virtual Reality)


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