6cm x 66cm RF Ion Source

Provides Highly Uniform Ion Beam Processing of Large-Scale Substrates

Ideal for uniform processing of large-scale substrates, Veeco’s 6 x 66cm RF linear ion source provides low-maintenance, filamentless operation on 100 percent argon, oxygen and other reactive gases for long uninterrupted production runs.

  • Provides the proper current densities and uniformities for pre-clean, etch and ion beam assisted deposition (IBAD) applications
  • Water-cooled
  • Reliable, uniform operation in both inert and oxidizing environments
  • Low-to-high power operation
  • Industry’s only filamentless RF Neutralizer enables longer production runs
  • Optional four-grid design offers very high collimation
  • Stable and efficient plasma operation allows precise control and high repeatability

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