6cm x 30cm DC Ion Source

Linear Source for Large/Wide Substrates or Large Substrate Batches

Veeco’s proven linear gridded DC Ion Sources are ideal for highly uniform, reliable ion beam deposition process platforms utilizing large/wide individual substrates or large substrate batches. They are an excellent resource for either linear or cylindrical fixturing.

  • Features the same innovative design, quality and reliability as Veeco’s world-class round ion beam sources
  • Provides uniform plasma and high-current density
  • Supports a wide beam energy range of 50 to 2000 eV with nominal beam currents per source up to 500 mA
  • Power supply options allow beam currents up to 800 mA

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