6cm x 22cm RF Ion Source

Linear RF Ion Source for Medium- and Large-Scale Pre-Clean, Etch and Deposition

Veeco’s 6 x 22cm gridded linear RF ion source is designed for highly productive in-line systems with pallets of substrates, large substrates or large arrays of small substrates. It is designed for high availability, low maintenance operation and is ideal for processes using 100 percent argon, oxygen or other reactive gases.

  • Provides the proper current densities and uniformities for pre-clean, etch and ion beam assisted deposition (IBAD) applications
  • Well-suited for low maintenance, long uninterrupted production runs
  • Reliable, uniform operation in both inert and oxidizing environments
  • Low to moderate power operation
  • Stable and efficient plasma operation allows precise control and high repeatability

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