16cm RF Ion Source

Broad, Uniform RF Ion Source for Highly Reactive Processes

Veeco offers a broad uniform ion beam source for reactive processes, such as ion beam assist or ion beam deposition of highly controlled optical coatings.

  • Supports wide range of operation: 50 to 1500eV and 75 to 700mA
  • Reliable, uniform operation in both inert and oxidizing environments
  • Water-cooled – For low-to-high power operation
  • Optional four-grid design offers very high collimation
  • Features the industry’s only filamentless RF Neutralizer, which provides low maintenance and enables long production runs
  • Stable and efficient plasma operation allows precise control and high repeatability
  • Well-suited to both batch and load-locked production processes

Our team is ready to help