“With the development of the GENxplor, Veeco has become the recognized leader in innovative MBE R&D technology,” said Professor Lu. “The open-architecture design and superior technology of the GENxplor system is a welcome addition to the research facility of National Laboratory of Solid State Microstructures and College of Engineering and Applied Sciences at Nanjing University. We are proud to receive the first system in China.”
The GENxplor system deposits high quality epitaxial layers on substrates up to 3″ in diameter and is used for a wide variety of applications such as developing high-speed transistors, fiber lasers for material processing, and wireless technology. Its efficient single frame design combines all vacuum hardware with on-board electronics to make it up to forty percent smaller than other MBE systems, saving valuable lab space.
“Since its introduction, the GENxplor has enabled essential semiconductor research at top universities and institutions around the world,” said Gerry Blumenstock, Vice President of Veeco’s MBE Operations. “The endorsement from Nanjing University and Dr. Lu firmly reinforces GENxplor as the leading R&D MBE system in the industry. After launching the system at the 2013 China MBE Conference, we are excited that Nanjing University, a leading materials science and condensed matter physics research university, is the first customer to install a GENxplor in China.”
Veeco’s process equipment solutions enable the manufacture of LEDs, displays, power electronics, compound semiconductors, hard disk drives, semiconductors, MEMS and wireless chips. We are the leader in MOCVD, MBE, Ion Beam, Wet Etch single wafer processing and other advanced thin film process technologies. Our high performance systems drive innovation in energy efficiency, consumer electronics and network storage and allow our customers to maximize productivity and achieve lower cost of ownership. For information on our company, products and worldwide service and support, please visit www.veeco.com.
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