Product News | Feb 18, 2016
A Leading R/O/Y LED Manufacturer Has Thoroughly Evaluated and Accepted the K475i Due to its Low Cost of Ownership, High Performance and Reproducible Results
Plainview, N.Y., February 18, 2016 – Veeco Instruments Inc. (Nasdaq: VECO) announced today the launch of the new TurboDisc® K475i™ Arsenic Phosphide (As/P) Metal Organic Chemical Vapor Deposition (MOCVD) System for the production of red, orange, yellow (R/O/Y) light emitting diodes (LEDs), as well as multi-junction III-V solar cells, laser diodes and transistors.
“Veeco continues to drive innovation with MOCVD technology that enables us to lower manufacturing costs and increase production with systems that are reliable, flexible and easy to use,” said Shuangxiang Zhang, General Manager of Yangzhou Changelight Co., Ltd. “The K475i quickly achieved unparalleled yield and brightness that will allow us to meet the growing demand for red, orange and yellow LEDs as well as other As/P based devices.”
According to research firm Strategies Unlimited, R/O/Y LED demand is expected to grow at a 10 percent compound annual rate through 2023. This demand for red, orange and yellow LEDs is being driven by signage, automotive, display and general lighting applications, as well as the emergence of new applications such as wearable smart devices.
Incorporating proprietary TurboDisc and Uniform FlowFlange™ MOCVD technologies, the new K475i system enables Veeco customers to reduce LED cost per wafer by up to 20 percent compared to alternative systems through higher productivity, best-in-class yields and reduced operating expenses.
“The new K475i is built upon production proven technologies that are incorporated into all of our industry-leading MOCVD systems,” said James T. Jenson, Senior Vice President and General Manager, Veeco MOCVD Operations. “We are very pleased with the world-class results reached at Changelight and their rapid qualification of the beta system. We have already seen strong industry interest in the K475i.”
Veeco’s proprietary Uniform FlowFlange technology produces films with very high uniformity and improved within-wafer and wafer-to-wafer repeatability resulting in the industry’s lowest cost of ownership. This patented technology provides ease-of-tuning for fast process optimization and fast tool recovery time after maintenance enabling the highest productivity for applications such as lighting, display, solar, laser diodes, pseudomorphic high electron mobility transistors (pHEMTs) and heterojunction bipolar transistors (HBTs).
Veeco’s process equipment solutions enable the manufacture of LEDs, displays, power electronics, compound semiconductors, hard disk drives, semiconductors, MEMS and wireless chips. We are the leader in MOCVD, MBE, Ion Beam, Wet Etch single wafer processing and other advanced thin film process technologies. Our high performance systems drive innovation in energy efficiency, consumer electronics and network storage and allow our customers to maximize productivity and achieve lower cost of ownership. For information on our company, products and worldwide service and support, please visit www.veeco.com.
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management’s Discussion and Analysis sections of Veeco’s Annual Report on Form 10-K for the year ended December 31, 2014 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
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