Product News | Oct 04, 2013
PLAINVIEW, N.Y.–(BUSINESS WIRE)–Oct. 4, 2013– Veeco Instruments Inc. (Nasdaq:VECO) announced today that the University of Nottingham, United Kingdom, purchased two GENxplor™ R&D Molecular Beam Epitaxy (MBE) Systems for its School of Physics and Astronomy. The systems will enable the growth of high quality, large area layers of graphene and boron nitride for advanced electronic and optoelectronic applications.
“Compared to other technologies, MBE better enables the high temperature and high uniformity deposition required to meet our stringent research demands,” said Dr. Sergei Novikov, Principal Research Fellow in the Faculty of Science at the University of Nottingham. “The GENxplor’s high-temperature substrate heater, open architecture and multi-system integration will allow us to grow materials in novel ways. It is our goal to develop electronic and optoelectronic devices, such as diodes and transistors, with improved performance by incorporating graphene and boron nitride materials.”
Graphene is a single molecule thick sheet of carbon atoms. High-quality graphene is very strong, light, nearly transparent, and an excellent conductor of heat and electricity. Boron nitride has an atomically smooth surface that is comparatively free of dangling bonds and charge traps.
The School of Physics & Astronomy at Nottingham runs one of the most popular undergraduate physics programs in the U.K. To learn more, visit http://www.nottingham.ac.uk/physics/index.aspx .
“We are excited that the University of Nottingham will add two GENxplor systems to their Veeco MBE installed base,” commented Jim Northup, Vice President, General Manager of Veeco’s MBE Operations. “Nottingham’s purchase supports our belief that the GENxplor – the industry’s first fully-integrated MBE system designed to deposit high quality epitaxial layers on substrates up to 3” in diameter – is a revolutionary approach for the research community.”
The GENxplor features an efficient, single frame design, integrating Veeco’s proven vertical chamber technology, with an easy to use transfer system and on-board electronics, making it up to 40% smaller than other MBE systems, saving valuable lab space. Its open architecture design also improves ease-of-use by providing convenient access to effusion cells and e-beam sources, improving serviceability compared to other MBE systems.
Veeco’s process equipment solutions enable the manufacture of LEDs, power electronics, hard drives, MEMS and wireless chips. We are the market leader in MOCVD, MBE, Ion Beam and other advanced thin film process technologies. Our high performance systems drive innovation in energy efficiency, consumer electronics and network storage and allow our customers to maximize productivity and achieve lower cost of ownership. For information on our company, products and worldwide service and support, please visit www.veeco.com .
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management’s Discussion and Analysis sections of Veeco’s Annual Report on Form 10-K for the year ended December 31, 2011 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
Source: Veeco Instruments Inc.
Veeco Instruments Inc.
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