News | Jan 27, 2026
Plainview, N.Y. (U.S.A) and Leuven (Belgium), January 27, 2026 – Veeco Instruments Inc. (Nasdaq: VECO) and imec announced today that they have collaboratively developed a 300mm high volume manufacturing compatible process that enables the integration of barium titanate (BaTiO3 or BTO) on a silicon photonics platform. BTO is a promising material with unique electro-optical properties that can be used for high-speed and low-power light modulation in emerging applications such as high-speed optical transceivers, quantum computing, light detection and ranging (LiDAR), and AR/VR applications. Historically, approaches to integrate BTO have struggled to meet the desired cost targets to make it viable for high-volume manufacturing. Veeco has now delivered its first Molecular Beam Epitaxy (MBE) based cluster system, marking a significant milestone in Veeco’s and imec’s partnership and their dedication to enhance silicon photonics platform capabilities. The new 300mm platform is designed for the epitaxy of BaTiO3 single crystalline thin films on silicon, available with both solid and hybrid Molecular Beam Epitaxy (MBE) solutions. With the integration of these alternative growth techniques, the system will be capable of BTO-on-Si deposition with improved repeatability and at a lower cost than classical MBE methods.
To read more, visit: https://www.imec-int.com/en/press/veeco-and-imec-develop-300mm-compatible-process-enable-integration-barium-titanate-silicon
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