Gridded RF Ion Sources

Gridded RF Ion Sources

Veeco's gridded RF ion sources are designed for improved production of long-run ion beam deposition processes.

12cm RF Ion Source

Improve the performance and quality of long uninterrupted reactive processes such as ion beam assist or ion beam deposition of optical coatings, with the Veeco 12cm RF Ion Source.

16cm High Power RF Ion Source

Ideal for for use in reactive processes, Veeco's 16cm RF HP ion source offers beam uniformity of <10% across 120cm.

6cm x 22cm RF Ion Source

Designed for highly productive in-line systems with substrates, Veeco's 6 x 22cm gridless linear RF ion source is ideal for processes using 100 percent reactive gases.

6cm x 66cm RF Ion Source

Ideal for uniform processing of large-scale substrates, Veeco's 6 x 66cm RF linear ion source provides low-maintenance, filamentless operation for long production runs.

NOVUS RF Ion Source Controller

Get stable power for ion source operation with Veeco's NOVUS RF lon Source Controller, featuring a state-of-the-art precision control system design.

16cm RF Ion Source

Get a broad uniform ion beam source for reactive processes such as ion beam assist or ion beam deposition of highly controlled optical coatings.