Veeco's gridded RF ion sources are designed for improved production of long-run ion beam deposition processes.
Get a broad uniform ion beam source for reactive processes such as ion beam assist or ion beam deposition of highly controlled optical coatings.
Improve the performance and quality of long uninterrupted reactive processes such as ion beam assist or ion beam deposition of optical coatings, with the Veeco 12cm RF Ion Source.
Get stable power for ion source operation with Veeco's NOVUS RF lon Source Controller, featuring a state-of-the-art precision control system design.
Designed for highly productive in-line systems with substrates, Veeco's 6 x 22cm gridded linear RF ion source is ideal for processes using 100 percent reactive gases.
Ideal for uniform processing of large-scale substrates, Veeco's 6 x 66cm RF linear ion source provides low-maintenance, filamentless operation for long production runs.
Ideal for for use in reactive processes, Veeco's 16cm RF HP ion source offers beam uniformity of <10% across 120cm.