Etch precise, complex features for high-yield production of discrete microelectronic devices and components with the NEXUS® Ion Beam Etch (IBE) Systems.
Raise data storage device yields and achieve exceptional uniformity with the NEXUS® IBE-420i™ Ion Beam Etching System.
Maximize slider yields and achieve excellent ion beam etch uniformity with the NEXUS® IBE-420Si™ Ion Beam Etching System.
Maximize the productivity of ABS deep cavity processing and high etch rate applications with Veeco's NEXUS® IBE-350Se™ Ion Beam Etching System.
Get improved process control, reduced footprint and a field-upgradable design with Veeco's NEXUS IBE-350Si Ion Beam Etching System.