Technologies and Products
Our product portfolio brings together a wide range of semiconductor manufacturing tools, from deposition to etch to encapsulation, all engineered to support evolving industry demands. Here’s a quick overview of the innovation powering Veeco’s comprehensive approach.
Veeco offers a broad spectrum of advanced semiconductor processing solutions, systems and sources, encompassing laser processing, lithography, ion beam deposition, MOCVD, wet processing, MBE, ALD (atomic layer deposition), PVD, dicing, lapping and gas delivery systems. These technologies are engineered to address the evolving needs of the semiconductor and related industries — from advanced node devices to photonics and data storage. Discover Veeco’s integrated suite of deposition, etch and encapsulation solutions designed to streamline every stage of device fabrication.
By providing a complete range of systems, Veeco empowers engineers to overcome the challenges of modern semiconductor manufacturing. Whether you’re exploring ALD for ultra-thin films or leveraging ion beam solutions for precision etching, our portfolio is tailored to help you achieve market-leading device performance. Explore our product listings to discover how Veeco’s comprehensive offerings can elevate your processes and accelerate innovation in semiconductor production.
Veeco has developed revolutionary technology to enable thermal annealing solutions at the most advanced technology nodes. Veeco delivers transformative low-cost-of-ownership, HVM production-proven laser spike annealing solutions to support the most advanced technology nodes.
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Veeco is the market leader in advanced packaging lithography systems designed to address the increasing challenges of smaller line and space patterning. Veeco lithography systems are Making a Material Difference with their industry-leading optical focus capability, proven high-volume production, and warped wafer handling for advanced packaging, LED, MEMS, and power device applications.
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Veeco's unmatched ion beam know-how delivers proven etch and deposition performance that has enabled the data storage and MEMS markets for decades. Our advanced ion beam sputtering, deposition, and etch systems achieve maximum uniformity and repeatability to meet the requirements of microelectronic devices.
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Lower your cost of ownership with Veeco’s new EpiStrideTM system for silicon carbide epitaxy. The EpiStrideTM system enables high-performance chemical vapor deposition of silicon carbide for both 6 and 8-inch wafer production, leading to the lowest cost of ownership per wafer and making it ideally suited for silicon carbide power electronic devices used in electric vehicles, renewable energy, and industrial applications.
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Veeco offers a range of industry-leading GaN and As/P MOCVD systems designed to maximize throughput while lowering cost of ownership for a variety of applications including display, 3D sensing, LiDAR, micro-LED display, and optical data communications. Designed to advance next-generation devices, Veeco allows users to customize their systems for superior uniformity and repeatability with low defectivity to maximize value.
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Surface preparation using sustainable practices is critical to ensuring the reliability of advanced microelectronics destined for AI and high performance computing, automotive applications, medical devices, 5G/6G and cloud storage. Veeco’s WaferStorm and WaferEtch platforms are the industry choice for several critical solvent-based processes as they provide high uniformity combined with low defectivity and flexible design to meet a wide range of process requirements.
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When you’re creating thin films of unique compound semiconductor materials one crystal at a time, you need a molecular beam epitaxy (MBE) system that is highly configurable. Veeco provides the industry’s broadest line-up of innovative and reliable MBE systems.
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We provide ALD systems for research and industry worldwide, delivering comprehensive services and versatile, turnkey systems that are accessible, affordable, and accurate to the atomic scale.
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Veeco's physical vapor deposition (PVD) systems offer maximum flexibility for a wide range of thin film deposition applications with advanced process capabilities, unsurpassed uniformity and multiple deposition modes. Our NEXUS platform integrates with a broad range of Veeco technologies, such as ion beam deposition, ion beam etch and atomic layer deposition to streamline multiple manufacturing steps and processes with ease.
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We deliver tight tolerances and superior flatness when performing dicing and lapping processes. With over 30 years of experience in diversified dicing applications, Veeco provides a broad range of process and tooling design solutions that can improve production and result in higher throughput and quality.
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Advanced semiconductor devices developed for the most leading-edge computing processes, such as AI and edge computing, need to be manufactured in ultra-high-purity environments. This is where material purity matters most, and where we can make a difference. Our gas and vapor delivery systems bring together the precise flow control, smart automation, and built-in diagnostics needed to help engineers maintain stability and repeatability.
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