Raise data storage device yields and achieve exceptional uniformity with the NEXUS® IBE-420i™ Ion Beam Etching System. It offers improved CD sigma control for data storage applications, faster time to market for new applications, faster install time and better asset utilization and cost of ownership.
- Designed to meet tighter etch depth control requirements
- NEXUS ion source provides exceptional WIW rotated and 3D etch uniformity
- Easily integrates with common technologies on world-class NEXUS hardware and software platform
- Combined with an enhanced control system, NEXUS ion source offers excellent WTW and RTR repeatability
- Available in single or dual cluster configurations
- Backward-compatible to existing Veeco device-net cluster front ends