Veeco Introduces Dimension Edge Atomic Force Microscope System
March 10, 2010
PLAINVIEW, N.Y., Mar 10, 2010 (BUSINESS WIRE) -- Veeco Instruments Inc. (Nasdaq: VECO), the leading provider of atomic force microscopy technology to the nanoscience community, announced today the Dimension(R) Edge(TM) Atomic Force Microscope (AFM) System for physical and life sciences investigation. This latest offering follows five major AFM releases from Veeco in 2009 alone, and offers the best-in-class performance of the Dimension Icon(R) in a simplified package with a compact footprint. Nanoscale researchers now can utilize the top levels of AFM capability at lower system costs and with streamlined operation.
"We continue to develop and release revolutionary new AFM products, modes and system improvements aimed at enabling our customers to push scientific boundaries and set new standards in their work," said David Rossi, Vice President and General Manager of Veeco's AFM Business. "We also want to break down the cost and productivity barriers facing today's researchers. With the Dimension Edge, Veeco again shows its dedication to making nanoscale materials and device characterization accessible to every facility and user."
About Dimension Edge
The mid-priced Dimension Edge AFM features hardware and software advances that reduce the time required to produce expert-level data, providing a seamless path from sample placement through optical identification of the region of interest, and from AFM survey mode to zoomed-in feature identification. The system's proprietary closed-loop and drift-compensated stage allow the productivity, accuracy, and sample versatility advantages of a large-sample, closed-loop system to be combined with the acquisition of high-resolution images traditionally only achieved by small-sample, open-loop systems. With lower noise levels, the Dimension Edge AFM system permits collection of the finer details critical to proper material identification, while protecting fragile tips and samples, and diminishing tip artifacts.
This core performance, along with a wide offering of AFM modes, give the Dimension Edge the exceptionally accurate imaging and single-point spectroscopy capabilities required for many applications, including the characterization of solar and semiconductor devices, the mapping of heterogeneous polymer-based materials, interrogation of individual nanoparticles, and in situ imaging of life science samples from single molecules to whole cells.
Veeco Instruments Inc. manufactures enabling solutions for customers in the HB-LED, solar, data storage, semiconductor, scientific research and industrial markets. We have leading technology positions in our three businesses: LED & Solar Process Equipment, Data Storage Process Equipment, and Metrology Instruments. Veeco's manufacturing and engineering facilities are located in New York, New Jersey, California, Colorado, Arizona, Minnesota and Massachusetts. Global sales and service offices are located throughout the U.S., Europe, Japan and APAC. For more information, visit http://cts.businesswire.com/ct/CT?id=smartlink&url=http%3A%2F%2Fwww.veeco.com&esheet=6208150&lan=en_US&anchor=www.veeco.com&index=3&md5=edeba53298f368c1683063559e72c83b .
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management's Discussion and Analysis sections of Veeco's Annual Report on Form 10-K for the year ended December 31, 2009 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
SOURCE: Veeco Instruments Inc.
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