Veeco Announces 7th Annual International Nanoscience Conference
February 11, 2009
PLAINVIEW, N.Y.--(BUSINESS WIRE)--Feb. 11, 2009-- Veeco Instruments Inc. (Nasdaq: VECO), the leading provider of atomic force microscopes (AFMs) to the nanoscience community, announced today that it will host the “Seeing at the Nanoscale VII” conference at the University of California, Santa Barbara (UCSB), July 28–31, 2009. Celebrating its seventh year, the conference provides the optimum forum for academic and industrial scientists to share information and exchange ideas on a wide variety of advanced nanotechnology topics, ranging from novel imaging approaches and unique material characterization to combining AFM with other technologies, such as confocal microscopy and Raman spectroscopy. This year there is also a special session on emerging AFM markets, such as energy generation, storage and conservation. Abstracts for oral and poster presentations are now being accepted at www.veeco.com/nanoconference .
The 2009 Seeing at the Nanoscale conference is chaired by David Awschalom, UCSB, and co-chaired by James Gimzewski, UCLA. In addition to invited presentations from each session chair, the conference will also feature oral presentations by Jun Hu of the Institute of Applied Physics, China; Hirofumi Yamada of Kyoto University, Japan; and co-chair James Gimzewski.
Professor Gimzewski, one of the pioneers of nanotechnology and SPM, commented, "In light of the physical manipulation capabilities of AFM, Seeing at the Nanoscale is increasingly ‘feeling’ at the nanoscale. The conference has become a great venue to hear about cutting-edge developments in enabling tools for nanotechnology, biology and medicine."
“The focused conference sessions and poster presentations allow hundreds of researchers from around the world to network and collaborate while addressing a select range of AFM-enabled discoveries. This process helps to accelerate global advances in nanoscience and nanotechnology.” said Chanmin Su, Director of AFM Technology at Veeco.
In conjunction with the three-day conference, Veeco will host an extensive one-day training course covering a variety of AFM techniques, such as HarmoniX™ Material Property Mapping and Microscope Image Registration Overlay (MIRO). Conference sessions for 2009 include:
Session 1: Force Probing and Imaging Biology to the Nanoscopic Scale
|Chair: Daniel Müeller, Dresden University of Technology, Germany|
Session 2: Next-Generation Materials and Polymer Systems
|Chair: Sergei Sheiko, University of North Carolina, USA|
Session 3: Beyond Topography: Measurement of Physical Properties at the Nanoscale ─
|Nanomechanical, Electrical, Optical, Magnetic and Thermal|
|Chair: Mark VanLandingham, U.S. Army Research Laboratory, USA|
Session 4: Extending the Limits of SPM: High-Speed Scanning, Ultra High-Resolution Imaging,
|Multiple-Probe SPM, Novel Probes and Combinations of AFM with Other Technologies|
|Chair: Olav Solgaard, Stanford University, USA|
Special Session: Nanoscale Materials for Energy Applications
|Chair: Mowafak Al-Jassim, National Renewable Energy Laboratory, USA|
The conference is co-sponsored by Veeco and the California NanoSystems Institute at UCSB. More details on session, abstract submission, and invited speaker presentations may be found at http://www.veeco.com/nanoconference .
Veeco Instruments Inc. manufactures enabling solutions for customers in the HB-LED, solar, data storage, semiconductor, scientific research and industrial markets. We have leading technology positions in our three businesses: LED & Solar Process Equipment, Data Storage Process Equipment, and Metrology Instruments. Veeco’s manufacturing and engineering facilities are located in New York, New Jersey, California, Colorado, Arizona, Minnesota and Massachusetts. Global sales and service offices are located throughout the U.S., Europe, Japan and APAC. http://www.veeco.com/
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management's Discussion and Analysis sections of Veeco's Annual Report on Form 10-K for the year ended December 31, 2007 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
Source: Veeco Instruments Inc.
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