Chemical Vapor Deposition

Chemical Vapor Deposition

Veeco's Chemical Vapor Deposition Systems allow the conformal metal deposition process to enable next-generation TFMHs and areal densities greater than 400gb/in².

NEXUS CVD Chemical Vapor Deposition System

Enable next-generation TFMHs with the NEXUS CVD system. It can be integrated on a common hardware and software platform with other Veeco technologies, such as IBE, IBD and physical vapor deposition.