Ion Beam Film Quality at Physical Vapor Deposition Rates
Produce the highest quality optical thin films with improved levels of productivity and throughput with the award-winning SPECTOR-HT™ Advanced Ion Beam System. Building on the proven performance of our SPECTOR® family of ion beam systems, the SPECTOR-HT system offers excellent layer thickness control, enhanced process stability and the lowest published optical losses in the industry.
For cutting-edge optical interference coating applications ranging from bandpass filters, beam splitters and laser passives, the SPECTOR-HT has been engineered to improve key production parameters such as target material utilization, optical endpoint control and process time.
The SPECTOR-HT gives manufacturers the qualitative advantages of ion beam sputtering (IBS) technology – low scatter loss, high film purity, stable deposition rates and film thickness control of <0.1nm – in a more robust package that significantly boosts throughput and lowers cost of ownership.
More on SPECTOR-HT System
- Increase your Throughput
Up to 400% increase in system throughput through improved deposition rates, increased lot sizes.
- Improve Materials Utilization
Up to 300% increase in target materials utilization, reduces maintenance and improves overall cost of ownership.
- Enhance Thin Film Uniformity
Optimized tool geometry combines with inherent IBS process technology advantages to deliver 50% better material uniformity.
- Engineered for Process Flexibility
SPECTOR-HT improves your process flexibility in multiple ways: our latest-generation process control system is operator-friendly, expanded lot sizes give you more process choices and stable deposition rates enable unattended system operation.
- Winner of prestigious 2013 R&D 100 award
SPECTOR-HT Product Introduction
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