The TurboDisc® MaxBright® MHP™ GaN MOCVD Multi-Reactor System is the new, modular high performance system that provides excellent yield, with as much as 20 percent within-wafer wavelength uniformity improvement over the MaxBright multi-reactor system, but with the same footprint, serviceability and layout configuration benefits of the MaxBright M™ multi-reactor system. Higher yields are achieved from hardware advancements that result in improved wavelength uniformity across all wafers. The MaxBright MHP multi-reactor system also provides lower cost of ownership as compared to the MaxBright multi-reactor system. This system leverages Veeco’s production-proven Uniform FlowFlange® gas distribution system technology and automation expertise by combining multiple high throughput MOCVD reactors in a modular two- or four-reactor cluster architecture. The improved reactors, based on Veeco’s highly successful K465i™ MOCVD system design, feature expanded wafer capacity and advanced, proprietary, closed-loop thermal control technology.
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