The TurboDisc® K475™ As/P MOCVD (metal organic chemical vapor deposition) System is the best-in-class tool for the highest volume production of select compound semiconductor devices, including:
The K475 MOCVD system is equipped to maximize uptime and throughput by leveraging Veeco’s long-standing technology expertise (as the market leader in the GaN LED market) and vital integration of critical reactor design elements. Elements include a tunable FlowFlange® gas distribution system, advanced RealTemp® 200 temperature control and ultimate TurboDisc high velocity laminar flow, along with an integrated system loadlock that remains under constant vacuum to minimize downtime between runs. All are key cost-savings driving the efficiency of the K475 MOCVD system.
Veeco: Ready for production.
CPV is a rapidly developing technology with multiple proof-of-concept scale installations (1 MW or less), with many more larger-scale projects gaining momentum worldwide within regions with high direct normal irradiance (DNI). As/P MOCVD is proving to be the technology of choice in building the critical compound semiconductor layers for CPV devices. Veeco, supplying best-in-class MOCVD equipment, provides the critical enabling As/P MOCVD technology to reduce the production costs of triple junction solar cells and provides manufacturers with the ability to easily ramp production in a modular system with unmatched reliability and throughput at the lowest cost.
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