MOCVD Systems

MOCVD Systems

TurboDisc K465i HP GaN MOCVD for High Volume LED Production

TurboDisc K465i HP GaN MOCVD for High Volume LED Production

Increased Productivity and Higher, Best-in-Class Yields

The TurboDisc® K465i™ HP™ GaN MOCVD System features a high-performance reactor designed to increase within-wafer wavelength uniformity by up to 20 percent. The K465i HP MOCVD system is based on the production-proven K465i MOCVD system platform and provides higher productivity for HB-LED high-volume production fabs around the globe. This system achieves superior uniformity and excellent run-to-run repeatability. It also offers high productivity due to its full automation and shortened recovery period after maintenance. The K465i HP MOCVD system is field upgradeable from the industry-leading K465i MOCVD system.

  • Up to 20 percent increase in within-wafer wavelength uniformity compared to K465i MOCVD system for highest productivity and best-in-class yields
  • Based on production-proven, high throughput K465i MOCVD platform
  • Incorporates new Uniform FlowFlange® gas distribution system technology for highest within-wafer uniformity and ultimate process repeatability
  • Simplified design provides ease of tuning for fast production qualification and fast recovery after maintenance
  • Low maintenance TurboDisc high velocity laminar flow technology enables highest system availability
  • Low cost of ownership for maximum profitability

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